Interactive study of straight-sided buckling patterns in thin films under compressive stress
LMP UMR 6630, SP2MI, bd Curie, Téléport 2, BP 179, 86960 Futuroscope Cedex, France
Corresponding author: Cleymand@lmp.univ-poitiers.fr
Accepted: 9 March 2000
Published online: 15 April 2000
In situ atomic force microscopy observations have been carried out of thin films under external compressive stress. Straight-sided buckling patterns arise perpendicular to the compression axis which tend to attract one another during propagation a few hundred nanometers apart. The mechanisms whereby these debonding patterns interact have been investigated taking into account the elastic energy of both the film and the substrate. The equilibrium distance between two straight-sided wrinkles has been determined; good agreement has been obtained between the experimental results and the mechanics involved.
PACS: 61.16.Ch – Scanning probe microscopy: scanning tunneling, atomic force, scanning optical, magnetic force, etc. / 68.35.Gy – Mechanical and acoustical properties; adhesion / 68.55.-a – Thin film structure and morphology
© EDP Sciences, 2000