https://doi.org/10.1051/epjap:2002094
Dynamic UV microstereolithography
1
Département de Chimie Physique des Réactions, ENSIC, 1 rue Grandville, BP 451, 54001 Nancy Cedex, France
2
Laboratoire d'Optique P.M. Duffieux, Université de Franche-Comté, 25030 Besançon Cedex, France
Corresponding author: serge.monneret@ensic.inpl-nancy.fr
Received:
10
December
2001
Revised:
15
July
2002
Accepted:
25
July
2002
Published online:
15
November
2002
A new process of microstereolithography to manufacture freeform solid three-dimensional micro-components with outer dimensions in the millimetre size range is presented. The process, based on the use of a liquid crystal display as a dynamic mask generator, works with conventional industrial UV-sensitive stereolithographic materials. The main innovation of the process consists in using the optical frequency up-conversion of images from the visible to the UV range in order to overcome the opacity of LCD's in the UV domain. 400 × 400 points up-converted images have been obtained to generate solid three-dimensional objects.
PACS: 82.50.Hp – Processes caused by visible and UV light / 42.30.Va – Image forming and processing / 42.65.Ky – Harmonic generation, frequency conversion
© EDP Sciences, 2002
