Eur. Phys. J. Appl. Phys. 43, 283-288 (2008)
https://doi.org/10.1051/epjap:2008070

Surface alloying of metallic substrates with pre-deposited films through a pulsed electron-beam mixing

Institute of High-Current Electronics, 2/3 Academichesky av., Tomsk 634055, Russia

Corresponding author: a_v_batrakov@mail.ru

Received: 16 November 2007
Revised: 29 December 2007
Accepted: 3 March 2008
Published online: 30 April 2008

Abstract

Microstructure and properties of the surface alloys resulted from a pulsed liquid-phase mixing of metallic substrates with pre-deposited films were studied. As a tool for the liquid-phase mixing, a low-energy (~30 keV), high-current (~30 kA) pulsed (0.8–3 µs) electron beam of energy density ranging from 1 to 15 J cm⁻² has been employed. Three immiscible systems (Ta/Fe; Al/Si/Al/Si/Al/Si/Al; Al/C/Al/C/Al) and two systems with different solid solubility of components (Cu/316 stainless steel; Zr/Ti/Ti-6Al-4V) were chosen for the surface alloying investigation.