Influence of humidity on photochemical ozone generation with 172 nm xenon excimer lamps

M. J. Salvermoser; U. Kogelschatz; D. E. Murnick

doi:10.1051/epjap/2009063

EPJ

Influence of humidity on photochemical ozone generation with 172 nm xenon excimer lamps

M. J. Salvermoser¹, U. Kogelschatz² and D. E. Murnick³

¹ Scientific Advisor to UV Solutions, Newark, NJ 07103, USA
² Retired from ABB Corporate Research, 5405 Baden, Switzerland
³ Department of Physics, Rutgers University, Newark, NJ 07102, USA

Received: 19 December 2008
Accepted: 23 January 2009
Published online: 17 April 2009

Abstract

The reaction kinetics of photochemical ozone (O₃) generation in humid air and oxygen (O₂) using efficient, narrow band vacuum ultra violet (VUV) 172 nm xenon excimer lamps is discussed. Trace amounts of water (H₂O) vapor in the process gas leads to hydroxyl (OH) and hydroperoxy (HO₂) radical formation. These radicals drive a catalytic O₃ destruction cycle limiting O₃ saturation concentration. This catalytic O₃ destruction cycle was included into a quantitative kinetic model describing photochemical O₃ production. Experimental O₃ saturation concentrations obtained with coaxial VUV driven photochemical O₃ generators compare satisfactorily with the models predictions.

PACS: 82.30.Cf – Atom and radical reactions; chain reactions; molecule-molecule reactions / 82.50.Hp – Processes caused by visible and UV light / 82.50.Nd – Control of photochemical reactions

Joint Annual Meeting of the Swiss and Austrian Physical Societies
26-30 August 2019
Zurich, Switzerland

EPJ

Influence of humidity on photochemical ozone generation with 172 nm xenon excimer lamps

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