https://doi.org/10.1051/epjap/2009120
Wettability and surface forces measured by atomic force microscopy: the role of roughness
FEMTO-ST. CNRS, Université de Franche-Comté, ENSMM, UTBM, 26 chemin de l'épitaphe, 25030 Besançon, France
Corresponding author: joseph.gavoille@ens2m.fr
Received:
3
March
2009
Accepted:
28
April
2009
Published online:
4
July
2009
Thin films of titanium, copper and silver with various roughnesses were prepared by physical vapour deposition technique: dc magnetron sputtering. By varying the deposition time from few minutes to one hour it was possible to obtain metallic films with surface roughness average ranging from 1 to 20 nm. The wettability of these films was studied by measuring the contact angle using the sessile drop method and surface forces were investigated using the atomic force microscopy (AFM) by measuring the pull-off force between the AFM tip and the surfaces. Experimental results have been mainly discussed in terms of metal surface reactivity, Young modulus of the materials and real surface of contact between the AFM tip and the film surfaces.
PACS: 68.35.Np – Adhesion / 68.37.Ps – Atomic force microscopy (AFM) / 81.15.Ef – Vacuum deposition
© EDP Sciences, 2009
