https://doi.org/10.1051/epjap/2010149
Control of the substrate temperature using a triode magnetron sputtering system
1
Santa Catarina State University, Plasmas Physics Laboratory, 89223-100, Joinville, SC, Brazil
2
Technological Institute of Aeronautics, Plasma Science and Technology
Laboratory, 12228-900, S.J. dos Campos, SP, Brazil
Corresponding author: daduarte@ita.br
Received:
8
March
2010
Revised:
3
July
2010
Accepted:
24
August
2010
Published online:
30
November
2010
The bombardment of ions and electrons at the substrate has been studied by varying the magnetic field distribution and the grid-target distance in a triode magnetron sputtering system. The substrate temperature was correlated with the substrate current density and with the type of species bombarding the substrate. The results indicate a possibility to modify and control the bombardment at the substrate surface from predominantly electronic to predominantly ionic, which increases the substrate temperature from 383 K to 473 K, respectively.
© EDP Sciences, 2010
