Eur. Phys. J. Appl. Phys. 56, 24006 (2011)
https://doi.org/10.1051/epjap/2011110164

Computational study of sheath structure in chemically active plasmas

¹ J.E. Purkinje University, Faculty of Science, Department of Physics, Ceske mladeze 8, 40096 Usti nad Labem, Czech Republic
² Charles University, Faculty of Mathematics and Physics, Department of Surface and Plasma Science, V Holesovickach 2, 18000 Prague 8, Czech Republic

^a e-mail: Stanislav.Novak@ujep.cz

Received: 15 April 2011
Revised: 16 July 2011
Accepted: 29 August 2011
Published online: 28 October 2011

Abstract

Results of computer simulations describing an interaction between a low-temperature multicomponent plasma and an immersed metal substrate are presented. For this purpose, computer model of volume processes in a DC glow discharge in Ar-O₂ mixture and a particle model of plasma-solid interaction were created. The interaction is studied not only in case when a constant value of voltage bias on the immersed substrate is kept, but also when sinusoidal voltage bias is applied. A pressure dependence of the sheath region in electronegative plasma is shown, too.