Eur. Phys. J. Appl. Phys. (2013) 64: 30301
https://doi.org/10.1051/epjap/2013130203

Deposition and characterization of highly energetic Al/MoO_x multilayer nano-films

School of Chemical Engineering, Nanjing University of Science and Technology, Nanjing 210094, P.R. China

^a e-mail: 719026474@qq.com

Received: 21 April 2013
Revised: 9 October 2013
Accepted: 4 November 2013
Published online: 9 December 2013

Abstract

Al/MoO_x nanoenergetic multilayer films (nEMFs) were deposited by magnetron deposition method. The samples with bilayer thicknesses of 75 nm and 225 nm were prepared, respectively, and the total thickness is 3 μm. The as-deposited Al/MoO_x nEMFs were characterized with varied analytical techniques, including SEM, XRD, XPS and DSC. Results show that the MoO_x films are amorphous, and are composed of MoO₃, Mo₂O₅ and MoO₂. The values of heat release in samples are 3524 J/g and 2508 J/g, respectively, and the final products are Mo, MoO₂, and Al₂O₃. Finally, the reaction paths and reaction kinetics of Al/MoO_x exothermic reactions were discussed.