https://doi.org/10.1051/epjap:2005057
High performance LTPS TFT with very large grains produced by sequential lateral crystallization
Advanced Display Research Center and Department of Physics, Kyung Hee
University, Dongdaemoon-ku, Seoul 130-701, Korea
Corresponding authors: sjpark@boehydis.com jjang@khu.ac.kr
Received:
12
May
2004
Revised:
15
June
2005
Accepted:
7
July
2005
Published online:
14
September
2005
We report the structural and electrical properties of polycrystalline
silicon on glass crystallized by using a CW Nd:YVO4 laser. Various
microstructures appear on amorphous silicon after a scanning of the laser
regardless of the crystallization process parameters such as laser power and
scan speed. The crystallized region could be characterized by their grain
size as 3 distinct regions; RTA-SPC (rapid thermal annealed-solid phase
crystallization) region, small-grain region and SLC (sequential lateral
crystallization) region with very large grains of ~10 μm. To verify
its electrical properties, p-ch TFTs were fabricated on the 3 different
regions. The characteristics of TFTs on SLC region were superior to those on
other regions and average performances of SLC poly-Si TFTs were cm2/V s,
V, S.S. = 0.5 V/dec, and
pA/μm at
V, respectively.
PACS: 85.30.Tv – Field effect devices / 68.47.Fg – Semiconductor surfaces / 68.35.Bs – Structure of clean surfaces (reconstruction) / 73.50.Dn – Low-field transport and mobility; piezoresistance
© EDP Sciences, 2005