https://doi.org/10.1051/epjap/2022210291
Regular Article
Aerosol assisted atmospheric pressure plasma jet for a high deposition rate of silica-like thin films
1
LAPLACE, CNRS, UPS, INPT, Université de Toulouse, 31062 Toulouse, France
2
LCC, CNRS, Université de Toulouse, 31062 Toulouse, France
* e-mail: nicolas.naude@laplace.univ-tlse.fr
Received:
16
December
2021
Received in final form:
31
March
2022
Accepted:
1
April
2022
Published online: 21 June 2022
This paper investigated thin films deposition processes of silica-like based on the injection of liquid droplets in Atmospheric Pressure Plasma Jet–APPJ operated in open air. An aerosol of hexamethyldisilane is produced by a syringe-pump and injected in a nitrogen post-discharge for different liquid precursor and carrier gas flow rates. For high carrier gas flow, this process enables to form silica-like without addition of oxygen in the plasma phase. Furthermore, this process offers a thin film dynamic deposition rate from 500 to 1400 nm.m.min−1 depending on the carrier gas flow and the film structure departs from silica-like to organosilicon layers for the lowest flow rates. These evolutions are attributed to plasma–droplets interactions related to the transport of droplets, the evaporation of liquid and plasma polymerization.
© R. Magnan et al., Published by EDP Sciences, 2022
This is an Open Access article distributed under the terms of the Creative Commons Attribution License (https://creativecommons.org/licenses/by/4.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original author(s) and source are credited.
