https://doi.org/10.1051/epjap/2022220201
Regular Article
Angular distribution of particles sputtered from the vanadium target by 5 keV Kr ions: simulation study
1
Laboratory of Artificial Intelligence & Complex Systems Engineering (AICSE), ENSAM, Hassan II University of Casablanca, Casablanca, Morocco
2
Laboratory of Materials, Energy, and Environment, Cadi Ayyad University, Marrakech, Morocco
3
Laboratoire LAMIGEP “Ecole Marocaine des Sciences de l'Ingenieur” (EMSI), Marrakech, Morocco
* e-mail: m.aitelfqih@gmail.com
Received:
20
July
2022
Received in final form:
4
August
2022
Accepted:
8
August
2022
Published online: 21 September 2022
The sputtering of vanadium particles at normal incidence was simulated. The SRIM-code combined to a new ANGULAIR and SDTrimSP simulation was employed to obtain the sputtering yields and the angular distribution of the atoms. The simulation was made for a large number of incident Kr+ ions with 5 keV energy, letting the computer count the number of emitted particles in the solid angle. The angular distribution of differential sputtering yields of vanadium shows an over-cosine tendency.
© EDP Sciences, 2022
