The European Physical Journal Applied Physics
Volume 23 / No 1 (July 2003)
Editorial
Semiconductors and Devices
Identification of hydrogen related defects in proton implanted float-zone silicon p. 5
Published online: 29 November 2002
DOI: 10.1051/epjap:2002113
Deuteron implantation into hexagonal silicon carbide: defects and deuterium behaviour p. 11
Published online: 29 November 2002
DOI: 10.1051/epjap:2002116
Evolution of He-induced cavities and related defects in silicon studied by direct scattering of channeled particles p. 19
Published online: 29 November 2002
DOI: 10.1051/epjap:2002115
μ-Raman investigations of plasma hydrogenated silicon p. 25
Published online: 25 February 2003
DOI: 10.1051/epjap:2003013
p-type doping by platinum diffusion in low phosphorus doped silicon p. 33
Published online: 29 November 2002
DOI: 10.1051/epjap:2002114
In-situ microscopy study of nanocavity shrinkage in Si under ion beam irradiation p. 39
Published online: 11 December 2002
DOI: 10.1051/epjap:2002120
Impact of gettering by helium implantation on boron and iron segregation p. 41
Published online: 27 June 2003
DOI: 10.1051/epjap:2003048
The role of a top oxide layer in cavities formed by MeV He implantation into Si p. 45
Published online: 12 June 2003
DOI: 10.1051/epjap:2003038
Magnetism, Superconductivity and Related Devices
Structure related magnetic properties of MnZn ferrite with ultra-fine grain structure p. 49
Published online: 12 June 2003
DOI: 10.1051/epjap:2003040
Imaging, Microscopy and Spectroscopy
A new numerical technique of electric field determination within dielectric materials plate and cable using the TSM method p. 63
Published online: 12 June 2003
DOI: 10.1051/epjap:2003042