The European Physical Journal Applied Physics

High-density microwave plasma of SiH₄/H₂ for high rate growth of highly crystallized microcrystalline silicon films p. 153

Oscillatory structure in radiation spectra of individual microplasmas in silicon carbide p-n-junctions p. 161

Pre-exponential factor for the crystallization of some chalcogenide glasses: applicability of Meyer-Neldel rule p. 169

Field and temperature effects on the electronic mobility in Alq3 structures p. 175

Optimization of an optical system used for laser beam transformation p. 183

Structural, AC conductivity and dielectric properties of Sr-La hexaferrite p. 189

Energy deposition effect on the NOx remediation in oxidative media using atmospheric non thermal plasmas p. 195

Formation of ion acoustic weak double layers in a dusty plasma p. 199

Is actinometry reliable for monitoring Si and silicone halides produced in silicon etching plasmas? A comparison with their absolute densities measured by UV broad band absorption p. 205

Light emission from corona discharge in SF₆ and SF₆/N₂ gas mixtures at high pressure p. 213

A sound card based multi-channel frequency measurement system p. 221

Experimental assessment of relative temporal fluctuation of CCD pixels p. 225