2016 Impact factor 0.684
Applied Physics
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The European Physical Journal Applied Physics

Volume 26 / No 3 (June 2004)


14th International Colloquium on Plasma Processes (CIP 2003)

Semiconductors and Devices

Surfaces, Interfaces and Films

Imaging, Microscopy and Spectroscopy

Editors-in-Chief
V. Serin and L. Vina
ISSN (Print Edition): 1286-0042
ISSN (Electronic Edition): 1286-0050

© EDP Sciences

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