The European Physical Journal Applied Physics

Volume 26 / No 3 (June 2004)

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14th International Colloquium on Plasma Processes (CIP 2003)

Monte Carlo modeling of gas phase ion transport under thermal gradients and external fields p. 177

S. Longo and P. Diomede

Published online: 07 April 2004

DOI: 10.1051/epjap:2004030

A study of growth mechanism of microcrystalline thin silicon films deposited at low temperature by SiF₄-H₂-He PECVD p. 187

M. Losurdo, M. Giangregorio, A. Grimaldi, P. Capezzuto and G. Bruno

Published online: 03 May 2004

DOI: 10.1051/epjap:2004032

Free Access

Foreword

Foreword of the CIP papers p. 193

CIP

Published online: 15 June 2004

DOI: 10.1051/epjap:2004037

Fluid description of the energy absorption in microwave discharges: a new perspective p. 195

L. L. Alves

Published online: 07 April 2004

DOI: 10.1051/epjap:2004031

Sterilization of dental bacteria in a N₂-O₂ microwaves post-discharge, at low pressure: influence of temperature p. 203

S. Villeger, A. Ricard and M. Sixou

Published online: 11 May 2004

DOI: 10.1051/epjap:2004034

Polyethylene ultrahydrophobic surface: synthesis and original properties p. 209

J. Fresnais, L. Benyahia, J. P. Chapel and F. Poncin-Epaillard

Published online: 11 May 2004

DOI: 10.1051/epjap:2004033

Polymerization and surface modification by low pressure plasma technique p. 215

M.-J. Tsafack, F. Hochart and J. Levalois-Grützmacher

Published online: 11 May 2004

DOI: 10.1051/epjap:2004038

Density of oxygen atoms in high pressure (10–50 torr) flowing microwave post-discharges for elastomer treatments p. 221

H. Blanchard, J. P. Sarrette, S. Villeger, P. Baudel and A. Ricard

Published online: 11 May 2004

DOI: 10.1051/epjap:2004036

Titration of N and C atoms in flowing N₂-CH₄ post-discharge between 300 K and 850 K p. 227

C. Jaoul, T. Czerwiec, T. Belmonte, A. Ricard and H. Michel

Published online: 11 May 2004

DOI: 10.1051/epjap:2004039

Semiconductors and Devices

Nonlinear response of superconductor bolometer to phonon fluxes p. 151

B. A. Danilchenko, Cz. Jasiukiewicz, T. Paszkiewicz and S. Wolski

Published online: 07 April 2004

DOI: 10.1051/epjap:2004027

Surfaces, Interfaces and Films

Pattern of root choice in a non-iterative semi-analytical ellipsometric inversion for non-absorbing films p. 161

R.S.-C. Ho

Published online: 29 March 2004

DOI: 10.1051/epjap:2004023

Imaging, Microscopy and Spectroscopy

Spectroscopic properties of MO-WO₃-P₂O₅: Ho³⁺ glasses p. 169

P. Subbalakshmi, B. V. Raghavaiah, R. Balaji Rao, N. Veeraiah, P. Babu and C. K. Jayasankar

Published online: 11 May 2004

DOI: 10.1051/epjap:2004035

EPJ

The European Physical Journal Applied Physics

Volume 26 / No 3 (June 2004)

14th International Colloquium on Plasma Processes (CIP 2003)

Monte Carlo modeling of gas phase ion transport under thermal gradients and external fields p. 177

A study of growth mechanism of microcrystalline thin silicon films deposited at low temperature by SiF₄-H₂-He PECVD p. 187

Foreword of the CIP papers p. 193

Fluid description of the energy absorption in microwave discharges: a new perspective p. 195

Sterilization of dental bacteria in a N₂-O₂ microwaves post-discharge, at low pressure: influence of temperature p. 203

Polyethylene ultrahydrophobic surface: synthesis and original properties p. 209

Polymerization and surface modification by low pressure plasma technique p. 215

Density of oxygen atoms in high pressure (10–50 torr) flowing microwave post-discharges for elastomer treatments p. 221

Titration of N and C atoms in flowing N₂-CH₄ post-discharge between 300 K and 850 K p. 227

Semiconductors and Devices

Nonlinear response of superconductor bolometer to phonon fluxes p. 151

Surfaces, Interfaces and Films

Pattern of root choice in a non-iterative semi-analytical ellipsometric inversion for non-absorbing films p. 161

Imaging, Microscopy and Spectroscopy

Spectroscopic properties of MO-WO₃-P₂O₅: Ho³⁺ glasses p. 169

Conference announcements

EPJ

The European Physical Journal Applied Physics

Volume 26 / No 3 (June 2004)

14th International Colloquium on Plasma Processes (CIP 2003)

Monte Carlo modeling of gas phase ion transport under thermal gradients and external fields p. 177

A study of growth mechanism of microcrystalline thin silicon films deposited at low temperature by SiF4-H2-He PECVD p. 187

Foreword of the CIP papers p. 193

Fluid description of the energy absorption in microwave discharges: a new perspective p. 195

Sterilization of dental bacteria in a N2-O2 microwaves post-discharge, at low pressure: influence of temperature p. 203

Polyethylene ultrahydrophobic surface: synthesis and original properties p. 209

Polymerization and surface modification by low pressure plasma technique p. 215

Density of oxygen atoms in high pressure (10–50 torr) flowing microwave post-discharges for elastomer treatments p. 221

Titration of N and C atoms in flowing N2-CH4 post-discharge between 300 K and 850 K p. 227

Semiconductors and Devices

Nonlinear response of superconductor bolometer to phonon fluxes p. 151

Surfaces, Interfaces and Films

Pattern of root choice in a non-iterative semi-analytical ellipsometric inversion for non-absorbing films p. 161

Imaging, Microscopy and Spectroscopy

Spectroscopic properties of MO-WO3-P2O5: Ho3+ glasses p. 169

Conference announcements

A study of growth mechanism of microcrystalline thin silicon films deposited at low temperature by SiF₄-H₂-He PECVD p. 187

Sterilization of dental bacteria in a N₂-O₂ microwaves post-discharge, at low pressure: influence of temperature p. 203

Titration of N and C atoms in flowing N₂-CH₄ post-discharge between 300 K and 850 K p. 227

Spectroscopic properties of MO-WO₃-P₂O₅: Ho³⁺ glasses p. 169